EBL System “Xi Zhi” Marks a Leap Forward in China’s Quantum Technology
By Chen Ye in Hangzhou | China Daily | Updated: August 16, 2025
China has achieved a significant breakthrough in quantum technology with the commercial development of its first electron beam lithography (EBL) system, named "Xi Zhi." Developed by Zhejiang University, the advanced system has entered application testing and aligns with international precision standards, signaling a promising step forward for domestic research and production of quantum chips.
Innovative “Nano-Brush” for Quantum Chips
The “Xi Zhi” system operates at 100kV and was developed at a key provincial laboratory affiliated with Zhejiang University’s Yuhang Institute for Quantum Innovation. Researchers there liken this large, cabinet-like machine to a "nano-brush"—a tool so precise it can "carve the map of an entire city on a single strand of hair."
Named after Wang Xizhi, a renowned Chinese calligrapher famous for his elegant brushwork, the system replaces the traditional brush with an electron beam to engrave intricate circuits directly onto silicon wafers. This direct writing process achieves an extraordinary precision of 0.6 nanometers with an 8 nanometer line width, allowing flexible design modifications without the need for traditional photomasks.
Transforming Chip Development
A senior researcher at the institute explained that the system’s flexibility and precision are especially valuable during the early research and development phases where numerous design iterations and line-by-line adjustments are necessary. "EBL offers high precision and convenience in ‘writing,’ greatly boosting efficiency in chip development," the researcher said.
This feature is critical for the evolving quantum computing and advanced semiconductor sectors, enabling accelerated innovation cycles while maintaining ultra-fine detail in chip architecture.
Overcoming International Constraints
One of the major challenges China faced in quantum chip R&D was limited access to cutting-edge EBL technology due to international export restrictions. This barrier had impeded leading domestic research institutions, including Zhejiang University and the University of Science and Technology of China, from acquiring the necessary lithography systems.
The launch of the indigenous “Xi Zhi” system breaks this bottleneck, making China the owner of a domestically controlled high-end EBL tool. Currently, “Xi Zhi” is undergoing procurement discussions with prominent industry players such as Huawei HiSilicon and various research institutes. Notably, it is offered at a price below the international average, enhancing its accessibility across Chinese technology sectors.
“Dual-New Integration” Fuels Success
The development of “Xi Zhi” benefits from Zhejiang province’s “dual-new integration” model, which emphasizes the fusion of technological innovation with industrial application. This strategic approach fosters seamless collaboration between academic research, industrial manufacturing, and market needs, accelerating the creation of cutting-edge technological products.
Strengthening China’s Semiconductor Ecosystem
The successful development and deployment of “Xi Zhi” represents a landmark advancement for China’s semiconductor industry, especially in the realm of quantum computing. The system’s localization supports China’s broader ambitions to reduce reliance on foreign technology and build a sovereign supply chain for next-generation chips.
Yuhang District’s Innovation Ambitions
The introduction of “Xi Zhi” aligns with Yuhang district of Hangzhou’s wider initiatives to boost integrated reforms spanning education, scientific research, and talent cultivation. Artificial intelligence is a key driver in these efforts as the district aims to establish itself as a demonstration zone for innovation. Future plans focus on creating landmark technological achievements by nurturing high-level platforms, attracting top talent, fostering enterprises, enabling projects, and promoting tech-focused finance.
As China pushes forward in the race for technological self-reliance, the “Xi Zhi” electron beam lithography system is a promising milestone that underlines the country’s growing capabilities in quantum technology and advanced semiconductors. This innovation not only enhances domestic research and industrial capability but also positions China for greater competitiveness in the global semiconductor arena.
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